000			00661cam a2200229 a 4500
999			_c3505 _d3505
005			20200813131941.0
008			041013s2005 njua b 001 0 eng
020			_a9780471720010
041			_aeng
082	0	0	_a530.44 _bLIE/P
100	1		_aLieberman, Michael A.
245	1	0	_aPrinciples of plasma discharges and materials processing
250			_a2nd ed.
260			_aHoboken, N.J. : _bWiley-Interscience, _cc2005.
300			_axxxv, 757 p. :
650		0	_aPlasma dynamics.
650		0	_aThin films _xSurfaces.
650		0	_aPlasma etching.
650		0	_aPlasma chemistry _xIndustrial applications.
700	1		_aLichtenberg, Allan J.
942			_cBK